Magnetic field-assisted chemical vapor deposition of iron oxide thin films: Influence of field—matter interactions on phase composition and morphology

2019-10-18 | Tomáš Duchoň
doi.org/10.1021/acs.jpclett.9b02381


The current cover of the Journal of Physical Chemistry Letters features our recent paper on magnetic field-assisted chemical vapor deposition (CVD). Within, we showcase the magnetic field as a versatile parameter for the control of phase composition, structure, and magnetic properties of iron oxide films grown via CVD. The methodology is applicable to a broader class of materials and provides a new degree of freedom to the scalable growth process.

JPCL cover page